PHOTORESIST DIRECT WRITE LITHOGRAPHY SYSTEM

AI Summary

The Department of the Navy is seeking quotes for a Photoresist Direct Write Lithography System, as detailed in the attached solicitation. This combined synopsis/solicitation follows FAR Subpart 12.6 guidelines, and proposals are requested without a formal written solicitation. Interested vendors must monitor the announcement on Contract Opportunities for any amendments. Questions should be directed to the specified contacts within ten days of the posting date.

Contract details

Solicitation No.: N0017325Q0006
Notice Type: Combined Synopsis/Solicitation
Set-Aside: Total Small Business Set-Aside (FAR 19.5)
Posted Date: June 3, 2025
Response Deadline: July 3, 2025
NAICS Code: 333242 AI guide
PSC / Class Code: 3670
Issuing Office: NAVAL RESEARCH LABORATORY
Sub-Agency: DEPT OF THE NAVY
Agency: DEPT OF DEFENSE
Primary Contact: Tamara Jenkins
City: WASHINGTON
State: DC
ZIP Code: 20375-5328
AI Product/Service: product

Description

This Request for Quote (RFQ) is for the procurment of a Photoresist Direect Write Lithography System as described in Attachment 1 of this solicitation.

This is a combined synopsis/solicitation for commercial items prepared in accordance with the format in Federal Acquisition Regulations (FAR) Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; proposals are being requested and a written solicitation will not be issued. Solicitation documents and incorporated provisions are those in effect through Federal Acquisition Circular 2021-06 and NMCARS 18-18.

All changes to this solicitation that occur prior to the closing date will be issued via amendment posted to the announcement on Contract Opportunities (beta.sam.gov). It is the responsibility of interested vendors to monitor the announcement for amendments that may be issued to this solicitation. For changes made after the closing date, only those quoters that provide a quote will be provided any changes/amendments and considered for future discussions and/or award.

Questions must be submitted to the Point(s) of Contact listed no later than ten (10) days after the Posted Date.

Key dates

June 3, 2025Posted Date
July 3, 2025Proposals / Responses Due

AI search tags

photoresist lithography system semiconductor manufacturing equipment precision manufacturing equipment commercial items

Frequently asked questions

PHOTORESIST DIRECT WRITE LITHOGRAPHY SYSTEM is a federal acquisition solicitation issued by DEPT OF DEFENSE. Review the full description, attachments, and submission requirements on SamSearch before the response deadline.