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    Closed Solicitation · DEPT OF DEFENSE

    PHOTORESIST DIRECT WRITE LITHOGRAPHY SYSTEM

    Issued by DEPT OF THE NAVY · NAVAL RESEARCH LABORATORY
    Sol. N0017325Q0006Combined Synopsis/SolicitationSet-aside: Total Small Business Set-Aside (FAR 19.5)WASHINGTON, DC
    Closed
    STATUS
    Closed
    closed Jul 3, 2025
    POSTED
    Jun 25, 2025
    Publication date
    NAICS CODE
    333242
    Primary industry classification
    PSC CODE
    3670
    Product & service classification

    AI Summary

    The Department of the Navy is seeking proposals for a Photoresist Direct Write Lithography System through a combined synopsis/solicitation. Interested bidders should refer to Attachment 1 for detailed specifications. Amendment 0001 addresses questions received, and all terms remain unchanged. Vendors must monitor the announcement on Contract Opportunities for any amendments. Questions must be submitted to the designated contacts within ten days of the posting date. Proposals are due by the specified closing date.

    Contract details

    Solicitation No.
    N0017325Q0006
    Notice Type
    Combined Synopsis/Solicitation
    Set-Aside
    Total Small Business Set-Aside (FAR 19.5)
    Posted Date
    June 25, 2025
    Response Deadline
    July 3, 2025
    NAICS Code
    333242AI guide
    PSC / Class Code
    3670
    Issuing Office
    NAVAL RESEARCH LABORATORY
    Sub-Agency
    DEPT OF THE NAVY
    Agency
    DEPT OF DEFENSE
    Primary Contact
    Tamara Jenkins
    City
    WASHINGTON
    State
    DC
    ZIP Code
    20375-5328

    Description

    Amendment 0001 is hereby issued to accomplish the following:

    1. Provide responses to questions received. 

    2. All other terms and conditions remain unchanged. 

    This Request for Quote (RFQ) is for the procurment of a Photoresist Direect Write Lithography System as described in Attachment 1 of this solicitation. 

    This is a combined synopsis/solicitation for commercial items prepared in accordance with the format in Federal Acquisition Regulations (FAR) Subpart 12.6, as supplemented with additional information included in this notice.  This announcement constitutes the only solicitation; proposals are being requested and a written solicitation will not be issued. Solicitation documents and incorporated provisions are those in effect through Federal Acquisition Circular 2021-06 and NMCARS 18-18.

    All changes to this solicitation that occur prior to the closing date will be issued via amendment posted to the announcement on Contract Opportunities (beta.sam.gov). It is the responsibility of interested vendors to monitor the announcement for amendments that may be issued to this solicitation. For changes made after the closing date, only those quoters that provide a quote will be provided any changes/amendments and considered for future discussions and/or award.

    Questions must be submitted to the Point(s) of Contact listed no later than ten (10) days after the Posted Date.

    Key dates

    1. June 25, 2025Posted Date
    2. July 3, 2025Proposals / Responses Due

    Frequently asked questions

    PHOTORESIST DIRECT WRITE LITHOGRAPHY SYSTEM is a federal acquisition solicitation issued by DEPT OF DEFENSE. Review the full description, attachments, and submission requirements on SamSearch before the response deadline.

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